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Corning: development of advanced substrates with Soitec

Corning Incorporated and the Soitec Group announced at the end of July 2009 that they have signed an agreement to work together on the development of high-performance silicon-on-glass (SiOG) substrate…

Corning Incorporated and the Soitec Group announced at the end of July 2009 that they have signed an agreement to work together on the development of high-performance silicon-on-glass (SiOG) substrates used in the flat panel mobile display market. The work of the two companies will focus on top-performance backplane substrate technology for organic light-emitting diode (OLED) mobile displays. This co-development work will address the key challenges to broad commercialization of the high-quality, cost-effective displays promised by mobile OLED technology, including backplane electron mobility and uniformity, and lower total system cost. Outstanding electrical backplane performance should, as a result, enable display manufacturers to achieve simplified processing and complex circuit integration. We are pleased to be working with Soitec, a leader in silicon-on-insulator (SOI) and silicon film transfer technology for the semiconductor industry, said Dr. Mark A. Newhouse, senior vice president and director, New Business Development, Corning Incorporated. This co-development work should lead to faster delivery of our SiOG substrates, which can enable the development of high-quality, cost-effective OLED displays, he added. This cooperative effort between Corning and Soitec is a natural extension of both companies“ core competencies. Together we hope to create low-cost, high-performance substrates for the mobile flat panel market, said Andr-Jacques Auberton-Herv, president, the Soitec Group. In addition to the focus on mobile display substrates, the co-development work can explore alternative applications for engineered substrates using glass and semiconductor thin films, which could significantly enlarge our portfolio of applications.

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