10 June 1999: According to a recent report, Asahi Glass was planning to launch sales of a new ultrapure fluoropolymer, “Ultra Pure Aflon” PFA, in May 1999. The new product was developed primarily for …
10 June 1999: According to a recent report, Asahi Glass was planning to launch sales of a new ultrapure fluoropolymer, “Ultra Pure Aflon” PFA, in May 1999. The new product was developed primarily for use in semiconductor manufacturing clean processes. Boasting an extremely low level of metal impurities, Ultra Pure Aflon PFA was developed in response to the need for equipment capable of handling high levels of integration and the increasing number of pins on semiconductor devices. Principal applications for the new material will be in liquid crystal, chemical/pharmaceutical and semiconductor manufacturing equipment, the report said. With the increasing integration of semiconductor devices, the gate oxide film that forms on the surface of a silicon wafer has become thinner. Reducing metal impurities to ensure the reliability of the gate oxide film has thus become a high priority for manufacturers. Demand is also expected to increase in future for reduced metal contamination for materials used to make tank linings, tubing, filter casings, valves and flow gauges used in cleaning and etching processes, it added. Ultra Pure Aflon PFA is the first fluoropolymer to guarantee a level of metal extraction from pellets that is lower than a specified criteria, making the product highly suited to use in semiconductor manufacturing equipment.